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An undated Illustration shows the optical light path inside ASML’s Twinscan NXE:3400B semiconductor lithography tool. ASML via Reuters
News Analysis
For weeks, Chinese state outlets have touted “major breakthroughs” in extreme-ultraviolet (EUV) lithography—the light-etching machines that make the world’s most advanced chips and the main choke point in Beijing’s semiconductor push.
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